产品概述/Product Introduction：

♦ LPCVD设备是半导体集成电路制造的重要设备之一， 主要用于多晶硅、氮化硅、氧化硅薄膜的生长,它是将原材料气体(或者液态源气化)用热能激活发生化学反应而在基片表面生成固体薄膜。LPCVD过程是在低压下进行的，由于气压低，气体分子平均自由程大，使生长的薄膜均匀性好，此外基片可以竖放使得设备装片量大，特别适用于工业化生产

LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing, which is mainly used for the growth of polysilicon, silicon nitride and silicon oxide thin films. It activates raw material gas (or liquid source gasification) with heat energy to generate solid thin films on the substrate surface. LPCVD process is carried out under low pressure. Because of low pressure and large average free path of gas molecules, the uniformity of the grown film is good. The substrate can be placed vertically, which makes the equipment load large, especially suitable for industrial production.

♦ 立式LPCVD采用钟罩式结构，设计嵌套腔体机械手传片组件、舟旋转组件,具有占地面积小成膜均匀性高、工艺稳定性高等优点。主要用于二氧化硅、掺杂多晶硅、氮化硅膜层的制备工艺

Vertical LPCVD adopts bell jar structure, and designs nested cavity manipulator film transmission assembly and boat rotation assembly, which has the advantages of small occupied area, high film formation uniformity and high process stability. It is mainly used for preparing silicon dioxide, doped polysilicon and silicon nitride films.